Scaling DRAM demands more than smaller features; it requires new architectures. We provide the process control and material precision to enable 3D stacking, advanced etch profiles, and atomic layer deposition of next-generation materials like molybdenum. Each step moves memory technology beyond its 2D limits and into a new dimensional era. Watch the video for more. | Lam Research Corporation
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Scaling DRAM demands more than smaller features; it requires new a…
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After 20 years of high-volume, tungsten-based atomic layer deposition, we’re equipping chipmakers with solutions set to power the future of AI. Learn how ALTUS® Halo technology helps enable molybdenum-based metallization for the development of next-generation DRAM and foundry logic devices. https://bit.ly/3FRnipp | Lam Research Corporation
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After 20 years of high-volume, tungsten-based atomic layer depo…
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Lam Research Corp. Introduces Breakthrough Deposition Technique to Enable Next-Generation MEMS for 5G and Beyond
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Deposition is essential to the fabrication process and varies depending on the material used and purpose it serves on a chip. While many methods exist, the five most common are: ◾ Chemical vapor deposition (CVD) ◾ Electrochemical deposition (ECD) ◾ Physical vapor deposition (PVD) ◾ Ultraviolet thermal processing (UVTP) ◾ Pulsed laser deposition (PLD) After more than four decades in the market, we remain one of the top suppliers of deposition technology and solutions. Explore our extensive produc
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We have been a leader in the deposition market for nearly 45 years, ranking among the top suppliers worldwide for deposition tools. Our tools include VECTOR® for plasma-enhanced CVD, Striker® for atomic layer deposition, and ALTUS® for metal ALD/CVD, among others. Dive deeper via the blog. https://bit.ly/4078QSi | Lam Research Corporation
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Lam Research Corp. Releases VECTOR ALD Oxide System
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We go back to the basics in our Semi 101 series, covering a range …
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