This study is led by Prof. Hai-Zhou Lu and Prof. Qihang Liu (Shenzhen Institute for Quantum Science and Engineering and Department of Physics, Southern University of Science and Technology). Every ...
Schematics for intra-layer and inter-layer quantum interference. Disclaimer: AAAS and EurekAlert! are not responsible for the accuracy of news releases posted to EurekAlert! by contributing ...
One of the main challenges of a Dual Damascene (DD) via-first process is the control of the Critical Dimensions (CDs) in the lithography of the trenches. The PhotoResist (PhR) thickness presents ...