Using an opto-mechanical architecture with a master-oscillator regenerative-ring amplifier, the 193-nm LithoTEX excimer laser for lithography scanning delivers a power output of 50 W with a pulse ...

Crystalline arsenic trisulfide shows record photorefractive response and can be laser-patterned at 500-nm resolution without ...

In addition, this product expands NTCJ's "semiconductor laser-based alternatives to mercury lamps," providing a new h-line light source option for photocuring, 3D printing, sensing, biomedical, and ...

Using ultra-fast laser beams, a team from the Irradiated Solids Laboratory has designed an experiment that allows both the creation of nanometric cavities in metal films and their study using several ...

Nuvoton Technology has introduced a high-power violet laser diode designed to support maskless lithography in advanced ...

OYAMA, Japan--(BUSINESS WIRE)--Gigaphoton, Inc. , a major lithography light source manufacturer, announced that the company will begin shipping the GT63A, the next-generation ArF excimer laser for ...

Design of the laser speckle exposure system. Schematic representation of the laser speckle exposure system, comprising the UV laser, shutter, beam expander, mirror, convex lens, engineering diffuser, ...

Nuvoton Technology has started mass production of high-power violet laser diodes. Its 402 nm, 4.5 W source is claimed to ...

These applications put forward stringent fabrication requirements, including dimensional accuracy, shape accuracy, and surface roughness. Two-photon lithography is a versatile technique capable of ...