SAN JOSE — KLA-Tencor Corp. here rolled out what the company says is the industry's first production-worthy, in-situ film thickness and end-point control system for copper metal polishing in chemical ...
Applied Materials Inc. today announced Reflexion LK, what it said is the industry's only low down force chemical mechanical polishing (CMP) system that planarizes low k and ultra-low k dielectric ...
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