From the last several lithography nodes, in the 14 to 10nm range, to the latest nodes, in the 7 to 5nm range, the requirements for patterning and image transfer materials have increased dramatically.
(Nanowerk Spotlight) Advances in semiconductor technology have reached a critical turning point. Silicon-based transistor technology, central to electronics, faces increasing limitations due to the ...
A review paper by scientists at Beijing Institute of Graphic Communication presented a thorough review of the existing research landscape, encapsulating the notable progress in swiftly expanding ...
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